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英语翻译1.Anorganometalliccompoundoftheformula(R1)mM(PR23)x,whereMisametalselectedfromthegroupconsistingofmanganese,technetium,rhenium,iron,ruthenium,osmium,nickel,palladium,andplatinum;eachR1isindependentlyselectedfromt
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英语翻译
1.An organometallic compound of the formula (R1)m M(PR23)x,where M is a metal selected from the group consisting of manganese,technetium,rhenium,iron,ruthenium,osmium,nickel,palladium,and platinum; each R1 is independently selected from the group consisting of hydrogen,deuterium,H2,D2 and a group of the formula --CR32 --CR32 --R4,each R2 is independently selected from the group consisting alkoxy,aryloxy,arylalkyl,arylalkoxy,alkylsilyl,arylsilyl,arylalkylsilyl,alkoxysilyl,aryloxysilyl,arylalkoxysilyl,alkylsiloxy,arylsiloxy,arylalkylsiloxy,alkoxysiloxy,aryloxysiloxy,arylalkoxysiloxy,alkylsilylalkyl,arylsilylalkyl,arylalkysilylalkyl,alkoxysilylalkyl,aryloxysilylalkyl,arylalkoxysilylalkyl,alkylsiloxyalkyl,arylsiloxyalkyl,arylalkylsiloxyalkyl,alkoxysiloxyalkyl,aryloxysiloxyalkyl,arylalkoxysiloxyalkyl,alkylsilylalkoxy,arylsilylalkoxy,arylalkylsilylalkoxy,alkoxysilylalkoxy,aryloxysilylalkoxy arylalkyloxysilylalkoxy,alkylsiloxyalkoxy,arylsiloxyalkoxy,arylalkylsiloxyalkoxy,alkoxysiloxyalkoxy,aryloxysiloxyalkoxy,and arylalkoxysiloxyalkoxy; each R3 is independently selected from the group consisting of hydrogen,deuterium,C1 -C6 alkyl,C1 -C6 cycloalkyl,phenyl,benzyl,(C1 -C2 alkyl or alkoxy)3 -silyl,and (C1 -C2 alkyl or alkoxy)3 -siloxy and wherein at least two groups R3 are selected from the group consisting of hydrogen and deuterium; R4 is hydrogen or deuterium; and wherein (a) when M is manganese,technetium or rhenium,m is 1; x is 5 and m+x is 6 and wherein said R2 groups are not all the same; and (b) when M is iron,ruthenium or osmium m is 0,1,2,3 or 4; x is 2,3,4 or 5 and m+x is 4,5,6 or 7; and wherein said R2 groups are not all the same; and (c) when M is nickel,palladium or platinum m is 0 or 2,x is 2,3 or 4 and m+x is 2,3,4,5 or 6; and wherein said R2 groups are not all the same.
Description
BACKGROUND OF THE INVENTION
This invention relates to organometallic compounds of metals of Groups VIIb,VIII,IX,and X including manganese,technetium,rhenium,iron,cobalt,nickel,ruthenium,rhodium,palladium,osmium,iridium and platinum and their uses in chemical vapor deposition (CVD) methods for depositing films of metal or metal derivatives on a substrate or forming a metal or metal derivative in powder form.More particularly the invention relates in preferred aspects to organometallic precursor compounds derived from metals of Groups VIIb,VIII,IX,and X especially suited for high purity deposition of the metal or a derivative such as,for example,a metal silicide,utilizing CVD techniques.
1.An organometallic compound of the formula (R1)m M(PR23)x,where M is a metal selected from the group consisting of manganese,technetium,rhenium,iron,ruthenium,osmium,nickel,palladium,and platinum; each R1 is independently selected from the group consisting of hydrogen,deuterium,H2,D2 and a group of the formula --CR32 --CR32 --R4,each R2 is independently selected from the group consisting alkoxy,aryloxy,arylalkyl,arylalkoxy,alkylsilyl,arylsilyl,arylalkylsilyl,alkoxysilyl,aryloxysilyl,arylalkoxysilyl,alkylsiloxy,arylsiloxy,arylalkylsiloxy,alkoxysiloxy,aryloxysiloxy,arylalkoxysiloxy,alkylsilylalkyl,arylsilylalkyl,arylalkysilylalkyl,alkoxysilylalkyl,aryloxysilylalkyl,arylalkoxysilylalkyl,alkylsiloxyalkyl,arylsiloxyalkyl,arylalkylsiloxyalkyl,alkoxysiloxyalkyl,aryloxysiloxyalkyl,arylalkoxysiloxyalkyl,alkylsilylalkoxy,arylsilylalkoxy,arylalkylsilylalkoxy,alkoxysilylalkoxy,aryloxysilylalkoxy arylalkyloxysilylalkoxy,alkylsiloxyalkoxy,arylsiloxyalkoxy,arylalkylsiloxyalkoxy,alkoxysiloxyalkoxy,aryloxysiloxyalkoxy,and arylalkoxysiloxyalkoxy; each R3 is independently selected from the group consisting of hydrogen,deuterium,C1 -C6 alkyl,C1 -C6 cycloalkyl,phenyl,benzyl,(C1 -C2 alkyl or alkoxy)3 -silyl,and (C1 -C2 alkyl or alkoxy)3 -siloxy and wherein at least two groups R3 are selected from the group consisting of hydrogen and deuterium; R4 is hydrogen or deuterium; and wherein (a) when M is manganese,technetium or rhenium,m is 1; x is 5 and m+x is 6 and wherein said R2 groups are not all the same; and (b) when M is iron,ruthenium or osmium m is 0,1,2,3 or 4; x is 2,3,4 or 5 and m+x is 4,5,6 or 7; and wherein said R2 groups are not all the same; and (c) when M is nickel,palladium or platinum m is 0 or 2,x is 2,3 or 4 and m+x is 2,3,4,5 or 6; and wherein said R2 groups are not all the same.
Description
BACKGROUND OF THE INVENTION
This invention relates to organometallic compounds of metals of Groups VIIb,VIII,IX,and X including manganese,technetium,rhenium,iron,cobalt,nickel,ruthenium,rhodium,palladium,osmium,iridium and platinum and their uses in chemical vapor deposition (CVD) methods for depositing films of metal or metal derivatives on a substrate or forming a metal or metal derivative in powder form.More particularly the invention relates in preferred aspects to organometallic precursor compounds derived from metals of Groups VIIb,VIII,IX,and X especially suited for high purity deposition of the metal or a derivative such as,for example,a metal silicide,utilizing CVD techniques.
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答案和解析
1.惯例(R1)m 的一种有机金属的化合物M(PR23)x,M 是金属被挑选从包括锰、technetium 、8 、钢、钌、锇、镍、钯,和白金的地方; 各R1 独立地被挑选从包括氢,氘,H2,D2 并且惯例的一个小组-- cr32 -- cr32 --R4,各R2 从小组包括alkoxy,aryloxy 、arylalkyl 、arylalkoxy 、alkylsilyl 、arylsilyl 、arylalkylsilyl 、alkoxysilyl 、aryloxysilyl 、arylalkoxysilyl 、alkylsiloxy 、arylsiloxy 、arylalkylsiloxy 、alkoxysiloxy 、aryloxysiloxy 、arylalkoxysiloxy 、alkylsilylalkyl 、arylsilylalkyl 、arylalkysilylalkyl 、alkoxysilylalkyl 、aryloxysilylalkyl 、arylalkoxysilylalkyl 、alkylsiloxyalkyl 、arylsiloxyalkyl 、arylalkylsiloxyalkyl 、alkoxysiloxyalkyl 、aryloxysiloxyalkyl 、arylalkoxysiloxyalkyl 、alkylsilylalkoxy 、arylsilylalkoxy 、arylalkylsilylalkoxy 、alkoxysilylalkoxy 、aryloxysilylalkoxy arylalkyloxysilylalkoxy 、alkylsiloxyalkoxy 、arylsiloxyalkoxy 、arylalkylsiloxyalkoxy 、alkoxysiloxyalkoxy 、aryloxysiloxyalkoxy,和arylalkoxysiloxyalkoxy 独立地被挑选; 各R3 独立地被挑选从包括氢,氘,C1 - C6 烷基,C1 - C6 cycloalkyl,苯基,苯基,(C1 - C2 烷基或alkoxy)3 - 甲硅烷基,和(C1 - C2 烷基或alkoxy)3 - siloxy 和至少二个小组R3 被挑选从包括氢和氘; R4 是氢或氘; 并且(a) 当M 是锰、technetium 或8,m 是1; x 是5 并且m+x 是6 和前述R2 小组不是所有相同; 并且(b) 当M 是钢,钌或锇m 是0,1,2,3 或4; x 是2,3,4 或5 和m+x 是4,5,6 或7; 并且前述R2 小组不是所有相同; 并且(c) 当M 是镍,钯或白金m 是0 或2,x 是2,3 或4 和m+x 是2,3,4,5 或6; 并且前述R2 小组不是所有相同.描述 发明的背景 这个发明与小组VIIb,VIII,IX,和X 金属有机金属的化合物关系包括锰、technetium 、8 、钢、钴、镍、钌、铑、钯、锇、铱和白金和他们的用途在化工蒸气证言(CVD) 方法为放置金属影片或金属衍生物在基体或形成金属或金属衍生物以粉末形式.特殊发明关系在更喜欢的方面与有机金属的前体化合物从小组被获得VIIb,VIII,IX,和X 金属特别是适合于金属或一种衍生物的高纯度证言譬如,例如,金属硅化物,运用CVD 技术
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